Paper

Aluminum films prepared by metal-organic low pressure chemical vapor deposition

Published Apr 27, 1984 · Martin L. Green, R. Levy, R. Nuzzo

Thin Solid Films

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Abstract

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Study Snapshot

Chemically vapor-deposited aluminum films show potential as metallizations for future large-scale integrated devices due to their low optical reflectivity and low surface roughness.

PopulationOlder adults (50-71 years)

Sample size24

MethodsObservational

OutcomesBody Mass Index projections

ResultsSocial networks mitigate obesity in older groups.

Aluminum films prepared by metal-organic low pressure chemical vapor deposition

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