Effect of Ti Substrate Ion Implantation on the Physical Properties of Anodic TiO2 Nanotubes
Zahra Jedi-soltanabadi, M. Ghoranneviss, Z. Ghorannevis
Mar 1, 2018
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Journal of the Korean Physical Society
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Key Takeaway Key Takeaway: Nitrogen-ion implantation on titanium substrates reduces surface roughness and enhances the morphology and optical band gap of anodic TiO2 nanotubes, with a band gap energy of approximately 3.02 eV.
Abstract
The influence of nitrogen-ion implantation on the titanium (Ti) surface is studied. The nontreated Ti and the Ti treated with ion implantation were anodized in an ethylene-glycol-based electrolyte solution containing 0.3 wt% ammonium fluoride (NH4F) and 3 vol% deionized (DI) water at a potential of 60 V for 1 h at room temperature. The current density during the growth of the TiO2 nanotubes was monitored in-situ. The surface roughnesses of the Ti substrates before and after the ion implantation were investigated with atomic force microscopy (AFM). The surface roughness was lower for the treated Ti substrate. The morphology of the anodic TiO2 nanotubes was studied by using field-emission scanning electron microscopy (FESEM). Clearly, the titanium nanotubes grown on the treated substrate were longer. In addition, some ribs were observed on their walls. The optical band gap of the anodic TiO2 nanotubes was characterized by using a diffuse reflection spectral (DRS) analysis. The anodic TiO2 nanotubes grown on the treated Ti substrate revealed a band gap energy of approximately 3.02 eV.