Paper
4-(tert-Butoxycarbonyloxy)benzyl p-toluenesulfonates as acid amplifiers applicable to chemically amplified photoresists
Published 2000 · Hiromitsu Ito, K. Ichimura
Macromolecular Chemistry and Physics
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Abstract
Aiming at the improvement of photosensitivity of photoimaging materials triggered by photoacid species, some 4-(tert-butoxycarbonyloxy)benzyl p-toluenesulfonates were synthesized as acid amplifiers, which generated p-toluenesulfonic acid autocatalytically in the presence of the acid in a non-linear manner. Among of the compounds tested, 4-(tert-butoxycarbonyloxy)-3-nitrobenzyl p-toluenesulfonate was superior for the present purpose because of its thermal stability in the absence of acid. When this compound was coupled with a chemically amplified photoresist system, photosensitivity was raised up to about 5 fold.
4-(tert-Butoxycarbonyloxy)benzyl p-toluenesulfonates can improve photosensitivity of photoimaging materials by up to 5 fold when combined with chemically amplified photoresist systems.
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