R. Solanki, P. Boyer, J. Mahan
Apr 1, 1981
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0
Influential Citations
54
Citations
Journal
IEEE Journal of Quantum Electronics
Abstract
We report the deposition of the refractory metals chromium, molybdenum, and tungsten through the laser‐induced gas‐phase photolysis of their respective hexacarbonyls. A copper, hollow cathode laser was used at ultraviolet wavelengths matched to peaks in the absorption spectra of the carbonyl molecules. Localized room‐temperature metal deposition was achieved by focusing the beam into a cell containing the carbonyl gas and helium as a buffer. No major differences were noted for deposition on a polished silicon wafer, a thermally oxidized silicon wafer, and a quartz flat.