W. Tsai, Horng-Ping Chen, W. Hsien
Mar 1, 2002
Citations
6
Influential Citations
168
Citations
Quality indicators
Journal
Journal of Loss Prevention in The Process Industries
Abstract
Abstract Perfluorocarbons (PFCs) are being used as etching/cleaning gases in microelectronic or semiconductor manufacturing processes. These compounds under industrial uses mainly include CF 4 (tetrafluorocarbon), C 2 F 6 (hexafluoroethane), C 3 F 8 (octafluoropropane), and cyclo-C 4 F 8 or c-C 4 F 8 (octafluorocyclobutane). From the globally environmental issues and regulatory points of view, it is urgent to control the emissions of these significant greenhouse gases from the industrial processes. This article reviews these PFCs in terms of physiochemical properties, industrial uses, and environmental hazards (e.g. global warming, and toxicity and exposure hazards). Further, it addresses some available recovery/recycle technologies (i.e. cryogenic condensation/distillation, pressure swing adsorption, and membrane separation) of process exhaust gases containing PFCs from semiconductor manufacturing processes in this review paper.