H. Groult, K. Van, A. Mantoux
Nov 22, 2007
Citations
0
Influential Citations
17
Citations
Journal
Journal of Power Sources
Abstract
Abstract Vanadium oxide films were synthesised by chemical vapour deposition (CVD) from pure of triisopropoxyvanadium oxide (VO(OC 3 H 7 ) 3 ) and oxygen as precursors. The influence of the substrate on the crystallinity of the vanadium oxide films was studied before and after annealing at 500 °C. On mica substrates, as-deposited film was composed of crystalline V 2 O 5 as revealed by XRD. On Pt, Ti, stainless steel, glass and F-doped SnO 2 substrates, an annealing procedure was required to get V 2 O 5 . SEM investigations have clearly evidence V 2 O 5 plates but the kinetics growth seems to be strongly dependent on the nature of the substrate. The insertion/extraction of Li + into the host structure was investigated in 1 M LiClO 4 -PC with annealed V 2 O 5 films deposited on Ti, Pt and stainless steel substrates. The best electrochemical performances were obtained in the potential range 3.8–2.8 V versus Li/Li + with V 2 O 5 films deposited onto stainless steel substrate: the reversible capacity reaches after subsequent cycles was about 115 mAh g −1 (rate C /23). In a wider potential range (between 3.8 and 2.2 V versus Li/Li + ), V 2 O 5 deposited onto Ti substrate exhibited the higher electrochemical performances (220 mAh g −1 for a rate of C /23).