A. Sekiguchi, I. Maruki, K. Ebata
1991
Citations
0
Influential Citations
24
Citations
Journal
Journal of The Chemical Society, Chemical Communications
Abstract
7,7,8,8-Tetramethyl-7,8-disilabicyclo[2.2.2]octa-2,5-diene 1, prepared by the high-pressure reaction (10 000 bar) of 1,1,2,2-tetramethyl-1,2-disilacyclohexa-3,5-diene and phenyl vinyl sulphoxide followed by elimination of benzenesulphenic acid, gave tetramethyldisilene (Me2SiSiMe2) upon photolysis which underwent a photochemical [2 + 4] reaction with benzene at 10 K in an argon matrix to regenerate the precursor.