Manisha Shirodker, V. Borker, C. Näther
Dec 1, 2010
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Influential Citations
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Journal
Indian journal of chemistry. Sect. A: Inorganic, physical, theoretical & analytical
Abstract
Tris(acetylacetonato)aluminium(III), [Al(C 2 H 7 O 2 ) 3 ], a precursor in vapor deposition of aluminum oxide, has been prepared starting from industrial alum, Al 2 (SO 4 ) 3 .16H 2 O and characterized by chemical, IR, thermal (TG-DSC) and single crystal X-ray diffraction analyses. The compound crystallizes in the monoclinic space group P2 1 /c and all atoms are located in general positions. The central metal is hexacoordinated to three bidentate acetylacetonate ligands.