J. S. Kim, H. A. Marzouk, P. J. Reucroft
Aug 10, 1993
Citations
0
Influential Citations
35
Citations
Journal
Thin Solid Films
Abstract
Low pressure chemical vapor deposition of aluminum oxide films from aluminum acetylacetonate and water vapor has been investigated. Water vapor played an important role in the film growth kinetics, film purity, and the surface morphology of the grown films. High water vapor pressures produced ligand-free pure Al2O3 films with a smooth surface even at a substrate temperature of 230 °C.