T. Naito, T. Ohfuji, M. Endo
1999
Citations
0
Influential Citations
13
Citations
Journal
Journal of Photopolymer Science and Technology
Abstract
Pinanediol monosulfonate derivatives were used as acid amplifiers for chemically amplified ArF resists. A highly transparent acid amplifier free of aromatics improved the sensitivity of the resist without sacrificing. the resolution. Adding this acid amplifier to an ArF resist doubled its sensitivity, and 0.15μm line-and-space patterns were resolved.