Hsi-Chao Chen, D. Jan, Chien-Han Chen
Mar 30, 2013
Citations
1
Influential Citations
45
Citations
Journal
Electrochimica Acta
Abstract
Abstract The purpose of this research was to investigate the bond and electrochromic properties of tungsten oxide (WO 3 ) thin films deposited by three different plasmas sources: direct current (DC), pulsed DC and radio frequency (RF). The experimental results show that optical intensity increases with an increasing oxygen percentage and that all films have a 950 cm −1 peak which results in a bond of W 6+ O in the Raman spectra. Hence, the oxygen percentage was changed from 0.3 to 0.7 to study the influence of coloring and bleaching as regards the different sputtering powers. Additionally, WO 3 thin films show the best electrochromic properties as regards the oxygen/argon (O 2 /Ar) gas ratios of 0.7, 0.6 and 0.6 for DC, pulsed DC and RF sputtering, respectively. The transmittances of all films are over 75% as-deposited, and the deposition rates were between 0.8 and 0.1 A s −1 . Simultaneously, the transmittance variations (Δ T ) were 51%, 57% and 53% for DC, pulsed DC and RF sputtering at a wavelength of 550 nm, respectively. The bleached/colored ability of the cyclic voltammograms (CVs) was pulsed DC > DC > RF. Since, the coloration ability of WO 3 thin film deposited with plasma source of pulsed DC was better than those of the DC and RF.