T. Ando, Naoki Nakata, Kazuharu Suzuki
Jan 18, 2012
Citations
0
Influential Citations
11
Citations
Journal
Dalton transactions
Abstract
A series of Ru(0) cyclooctatetraene complexes are presented with optimal properties for MOCVD (metal organic chemical vapour deposition) applications, including combinations of the two lowest melting points and lowest decomposition temperatures yet reported for such materials. The compounds are easy to handle and lead to highly conformal thin films of Ru on SiO(2) features; even within holes with aspect ratios of 40 : 1. SEM, AFM and XPS studies confirm the near ideal nature of the resulting conformal thin film.