T. Itani, J. Santillan
Dec 4, 2009
Citations
0
Influential Citations
29
Citations
Journal
Journal of Vacuum Science & Technology B
Abstract
The use of the tetrapropylammonium hydroxide (TPAH) and tetrabutylammonium hydroxide (TBAH) aqueous developer solutions is proposed as an alternative to the tetramethylammonium hydroxide (TMAH) aqueous developer solution (semiconductor industry standard). A polyhydroxystyrene-based extreme ultraviolet (EUV) resist was utilized at a film thickness of 60nm. To confirm the effectiveness of these alternative developer solutions in improving linewidth roughness (LWR) performance, patterning exposures were carried out using the small field exposure tool with annular (σouter0.7∕σinner0.3) illumination conditions. Dissolution contrast curves of EUV resist using the TMAH, TPAH, and TBAH developer solutions have shown similar dissolution characteristics which means that the use of these alternative developer solutions might have minimal effect on the resist resolution limit and sensitivity. Imaging performance analysis results have shown negligible effect on the resolution capability and sensitivity. A 20% LWR impr...