X. Ding, Y. Kawaguchi, H. Niino
Feb 19, 2003
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Abstract
Laser-induced backside wet etching of fused silica plates using aqueous solutions of naphthalene-1,3,6-trisulfonic acid trisodium salt (Np) and pyranine (py) was performed upon KrF excimer laser irradiation at 248 nm. The two etching media show different etching behavior with changing laser fluence and medium concentrations. Well-defined line-and-space and grid micropatterns at 1 μm scale were fabricated using an aqueous solution of Np and the etched pattern was free of debris and microcracks.