J. Goswami, Changzhen Wang, P. Majhi
Aug 1, 2001
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Influential Citations
22
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Journal
Journal of Materials Research
Abstract
Highly (111)-oriented and conformal iridium (Ir) films were deposited by a liquid source metalorganic-chemical-vapor-deposition process on various substrates. An oxygen-assisted pyrolysis of (methylcyclopentadienyl) (1,5-cyclooctadiene) Ir precursor at a wide range of substrate temperatures ( T _sub) between 300 and 700 °C was used. At a low T _sub of 350 °C, the randomly oriented polycrystalline films exhibited an I 111/ I 200 x-ray intensity ratio of 6. However, the films deposited at T _sub = 700 °C on native SiO_2 and amorphous SiO_2 surfaces were highly oriented with the I _111/ I _200 ratios of 277 and 186, respectively. The transmission electron microscopy study revealed continuous, dense, and faceted microstructures of Ir films. Also, the step coverage of Ir on TiN (64%) was higher than that on amorphous SiO_2 (50%) surfaces.