Qianrun Zhao, Junqi Tang, Ning Zhang
Nov 15, 2014
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Abstract
The texturization of monocrystalline silicon wafers using a mixture of potassium phosphate tribasic (K3PO4) and potassium phosphate dibasic (K2HPO4) solutions has been investigated. A series of comparative experiments were made to indicate the dependence of hemispherical surface reflectance on the solution temperature, the etching time, and the concentration of K3PO4 and K2HPO4. The hemispherical surface reflectance and the surface morphology were measured with a UVVisible Spectrophotometer and a scanning electronic microscope (SEM), respectively. A wafer with uniform pyramid structures and an average weighted reflectance of 11.27% was obtained after texturing with the mixed solution of 15wt% potassium phosphate tribasic (K3PO4) and 1wt% potassium phosphate dibasic (K2HPO4) at 85°C for 15min. our results show that the texturing method based on K3PO4/K2HPO4 solutions is cost effective, has low pollution and good reproducibility, This method is promising for a large-scale production of crystalline silicon solar cells. Keywords-Solar cell; Texturing; Monocrystalline silicon; Phosphate; Reflectance