Jürgen Dahlhaus, P. Jutzi, H. Frenck
May 1, 1993
Citations
0
Influential Citations
10
Citations
Journal
Advanced Materials
Abstract
Silicon nitride (Si3N4) and silica (SiO2) thin films are of interest for applications in microelectronics and optics. Non-hazardous alternatives to silane (SiH4) as the silicon precursor in the chemical vapor deposition (CVD) of these materials are an attractive target for research. It is shown that pentamethylcyclopentadiene-substituted silanes offer the opportunity to tailor precursors for particular CVD requirements.