J. Pola, R. Tomovska, S. Bakardjieva
Oct 15, 2003
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Influential Citations
4
Citations
Journal
Journal of Non-crystalline Solids
Abstract
Abstract Megawatt ArF laser-induced photolysis of gaseous trimethyl(vinyloxy)silane (TMVSi) results in chemical vapor deposition of solid nano-sized polyoxocarbosilane that is deduced as formed via agglomeration of SiCHnO species (n⩽3). The laser fabricated polymer shows superior thermal stability, contains radical Si centers and is described as a cross-linked polymethyloxocarbosilane consisting of CnSiO4−n (n=0–3) configurations.