M. Trommer, W. Sander, A. Patyk
Dec 1, 1993
Citations
0
Influential Citations
25
Citations
Journal
Journal of the American Chemical Society
Abstract
The photochemical and thermal oxidation of 1-methylsilene (2-silapropene) (1a), 1,1-dimethylsilene (1b), and 1,1,2-trimethylsilene (1c) has been investigated in O 2 -doped argon matrices. All silenes 1 are easily photooxidized in matrices containing more than 1% O 2 , but trimethylsilene (1c) is the only silene that exhibits thermal reactivity toward oxygen at temperatures as low as 20-40 K. The photochemical reactivity increases from 1a to 1c with increasing number of methyl groups at the double bond and decreasing ionization potential. Key intermediates in both the photochemical and the thermal oxidation of 1 are siladioxetanes 9