Si-Moo Lee, Dong-lae Kim, H. Youn
Feb 15, 2000
Citations
0
Influential Citations
12
Citations
Journal
Japanese Journal of Applied Physics
Abstract
Tin oxide films were produced by chemical vapor deposition using monobutyltin trichloride and oxygen as reactants. The effect of H2O addition on deposition behavior and electrical properties at various deposition temperatures were investigated. The addition of H2O significantly increased deposition rates and lowered corresponding apparent activation energies at low temperatures. At high temperatures, however, the addition of H2O decreased electrical conductivity in films, which was attributed to a decrease in carrier concentration, i.e. incorporated Cl content. It was therefore unlikely that both the deposition rate and the conductivity, in case of H2O addition, were controlled by the same reaction. It could be suggested that while the deposition rate is enhanced by the well known hydrolytic decomposition of the Sn–Cl bond, the electrical conductivity (incorporated Cl amount) is determined by a reaction involving the removal of surface Cl.