M. Ishikawa, M. Kumada
Sep 1, 1972
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Influential Citations
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Journal
Journal of Organometallic Chemistry
Abstract
Abstract The UV photolysis of dodecamethylcyclohexasilane (I) in cyclohexane at ca. 45° proceeds readily will loss of dimethylsilylene species to give two of the lower homologs, viz , decamethylcyclopentasilane and octamethylcyclotetrasilane. Prolonged photolysis leads to the formation of a significant amount of 1,4- dihydrohexamethyltetrasilane, which can be ascribed to homolytic scission of the silicon-silicon bond of the cyclotetrasilane. The photochemically generated dimethylsilylene species readily insert into siliconhydrogen or siliconmethoxy bonds of appropriate monosilane derivatives. However, photolysis of (I) in dimethyldichlorosilane affords several products whose formation may be best explained in terms of a direct reaction of photochemically excited polysilanes with chlorosilanes. Other evidence for this comes from the photolysis of tetradecamethylhexasilane in dimethyldichlorosilane.