L. Tong, Yujun Shi
Apr 30, 2009
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Influential Citations
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Journal
Thin Solid Films
Abstract
Abstract The gas-phase chemical species produced from both the direct decomposition of 1,1,3,3-tetramethyl-1,3-disilacyclobutane (TMDSCB) on a tungsten filament and the secondary reactions in the HWCVD reactor were identified by vacuum ultraviolet laser single-photon ionization coupled with time-of-flight mass spectrometry. TMDSCB decomposes on the filament to methyl and 1,1,3-trimethyl-1,3-disilacyclobutane-1-yl radicals. Subsequent hydrogen abstraction reactions from the parent molecule by methyl radicals and biradical combination reactions are dominant in the reactor. The formation of dimethylsilene ( m / z = 72) through the ring Si–C bond cleavage is indirectly confirmed by the observation of the signal from 1,1,3,3,5,5-hexamethyl-1,3,5-trisilacyclohexane at m / z = 216. Tetra- and tri-methylsilane are also found to be formed in the HWCVD reactor.