M. Ishida, J. Fujita, T. Ogura
Jun 1, 2003
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Influential Citations
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Journal
Japanese Journal of Applied Physics
Abstract
We examined the properties of p-chloromethyl-methoxy-calix[4]arene (CMC4) as a high-resolution negative-tone resist for electron-beam (EB) lithography. CMC4's highest resolution was less than 8 nm, and of the calixarene resists studied so far, it has the highest solubility in Cl-free solvents. Comparison with the p-chloromethyl-methoxy-calix[6]arene (CMC6) resist revealed that the CMC4 resist's low molecular weight and low crystallinity were the origin of its high resolution and high solubility.