Kazuya Matsumoto, Y. Shibasaki, S. Ando
2005
Citations
0
Influential Citations
14
Citations
Journal
Journal of Polymer Science Part A
Abstract
A chemically amplified photosensitive and thermosetting polymer based on poly[2,6-di(3-methyl-2-butenyl)phenol (15 mol %)-co-2,6-dimethylphenol (85 mol %)] (3c) and a photoacid generator [(5-propylsulfonyloxyimino-5H-thiophen-2-ylidene)-(2-methylphenyl)acetonitrile] was developed. Poly[2,6-bis(3-methyl-2-butenyl)phenol]-co-2,6-dimethylphenol)] (3) with high molecular weights (number-average molecular weight ∼ 24,000) was prepared by the oxidative coupling copolymerization of 2,6-di(3-methyl-2-butenyl)phenol with 2,6-dimethylphenol in the presence of copper(I) chloride and pyridine as the catalyst under a stream of oxygen. The structures of 3 were characterized with IR, 1 H NMR, and 13 C NMR spectroscopy. 3 was crosslinked by a thermal treatment at 300 °C for 1 h under N 2 . The 5% weight loss temperatures and glass-transition temperatures of the cured copolymers reached around 420 °C in nitrogen and 300 °C, respectively. The average refractive index of the cured copolymer (3c) film was 1.5452, from which the dielectric constant at 1 MHz was estimated to be 2.6. The resist showed a sensitivity of 35 mJ cm -2 and a contrast of 1.6 when it was exposed to 436-nm light, postexposure-baked at 145 °C for 5 min, and developed with toluene at 25 °C. A fine negative image featuring 8-μm line-and-space patterns was obtained on a film exposed to 100 mJ cm -2 with 436-nm light in the contact-printed mode.