G. D. Giuseppe, J. Selman
Nov 15, 2003
Citations
0
Influential Citations
8
Citations
Journal
Journal of Electroanalytical Chemistry
Abstract
Abstract Molybdenum hexacarbonyl, Mo(CO) 6 , and molybdenum hexafluoride, MoF 6 , have been used as precursors, with hydrogen or methane as reductants, to produce thin, dense and largely uniform layers of amorphous structure, on silicon (100) substrates. A plasma enhanced chemical vapor deposition (PECVD) setup was used for the deposition. XPS and AES analysis showed that Mo(CO) 6 with CH 4 produces a film containing a mixture of Mo compounds, mostly consisting of MoO 2 . Carbon appears to be present as Mo 2 C rather than elemental carbon, although the latter is thermodynamically favored. Similarly, Mo(CO) 6 and H 2 as the reactant mixture produce a film containing only one single, metastable compound, namely a Mo-oxycarbide. A mixture of MoF 6 with hydrogen is capable of producing pure molybdenum deposits without fluorine surface contamination. With CH 4 as the reductant, MoF 6 is expected to produce a mixture of elemental Mo and Mo 2 C, while MoF 6 with NH 3 as the reductant is expected to yield predominantly Mo 2 N.