M. Salerno, R. Cingolani
Oct 25, 2007
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Influential Citations
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Journal
Journal of Micromechanics and Microengineering
Abstract
We have developed an all-polymer procedure for sub-microscale large area patterning of fused silica plates based on electron beam lithography. The procedure relies on the use of a high sensitivity resist, negative tone epoxy-based SU-8 and a conducting polymer, a doped PDOT, as the electron discharge layer. The chemically amplified resist SU-8 allows for a five-fold increase in exposure speed as compared to standard PMMA, and the PDOT layer makes it possible to avoid the time-consuming deposition of a metallic layer and its critical removal. Gratings of stripes and pillars, possibly useful for the realization of photonic devices, are demonstrated.