5 papers analyzed
These studies suggest that hydrogen plasma can reduce carbon impurities and improve the quality of ALD thin films using cobaltocene as a precursor.
Hydrogen plasma plays a significant role in the atomic layer deposition (ALD) of thin films, particularly when using cobaltocene as a precursor. Understanding how hydrogen plasma influences the carbon content in these films is crucial for optimizing their properties for various applications.
Reduction of Carbon Impurities:
Influence on Film Composition and Structure:
Impact on Film Properties:
Hydrogen plasma significantly reduces carbon impurities in ALD thin films when using cobaltocene as a precursor. Higher frequency hydrogen plasma enhances surface reactions, leading to denser films with lower carbon content. The use of hydrogen/nitrogen plasma mixtures further stabilizes film composition and minimizes carbon contamination, resulting in improved film properties.
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