How does hydrogen plasma influence the carbon content in ALD thin films with cobaltocene as precurso
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Influence of Hydrogen Plasma on Carbon Content in ALD Thin Films with Cobaltocene as Precursor
Introduction to Hydrogen Plasma in ALD Processes
Atomic Layer Deposition (ALD) is a technique used to create thin films with precise control over thickness and composition. The use of hydrogen plasma in ALD processes can significantly influence the properties of the resulting films, particularly when using cobaltocene (CoCp₂) as a precursor. This article explores how hydrogen plasma affects the carbon content in ALD thin films.
Hydrogen Plasma and Carbon Incorporation
Role of Hydrogen Plasma in Reducing Contaminants
Hydrogen plasma plays a crucial role in reducing contaminants such as oxygen and bromine in thin films. For instance, in the deposition of hydrogenated amorphous carbon (a-C:H) films, hydrogen plasma helps in minimizing the incorporation of these contaminants, leading to purer films. This reduction in contaminants is essential for achieving high-quality thin films with desired properties.
Interaction with Cobaltocene Precursor
When cobaltocene is used as a precursor in ALD processes, hydrogen plasma facilitates the dissociation of the Cp ligand from the Co atom. This interaction is critical for the formation of Co-Co bonds and the subsequent deposition of cobalt thin films. The hydrogen plasma not only aids in the removal of unwanted ligands but also promotes the formation of active sites necessary for the adsorption of precursor molecules.
Temperature Dependence and Film Composition
Temperature Effects on Nitrogen Incorporation
The temperature during the ALD process significantly affects the composition of the resulting films. For example, at temperatures below 290°C, the interaction between NH₃ plasma and CoCp₂ leads to the formation of cobalt nitride (Co₂N). However, as the temperature increases to 300°C and beyond, the nitrogen content decreases, resulting in a mixture of Co₃N and pure Co, and eventually, pure Co at 350°C. This temperature dependence highlights the importance of precise temperature control in achieving the desired film composition.
Impact on Carbon Content
The use of hydrogen plasma in conjunction with cobaltocene can influence the carbon content in the deposited films. Hydrogen plasma helps in breaking down the carbon-containing ligands, thereby reducing the carbon content in the final film. This process is essential for applications where low carbon content is desired, such as in the deposition of pure cobalt films.
Conclusion
Hydrogen plasma plays a pivotal role in the ALD process, particularly when using cobaltocene as a precursor. It aids in reducing contaminants, facilitating ligand dissociation, and controlling the carbon content in the resulting films. The temperature during the ALD process further influences the film composition, with higher temperatures leading to reduced nitrogen and carbon content. Understanding these interactions is crucial for optimizing ALD processes to achieve high-quality thin films with specific properties.
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